Please use this identifier to cite or link to this item: http://hdl.handle.net/11452/26565
Title: The electrical characterization of electrodeposited Ni thin film on silicon: Schottky barrier diodes
Authors: Tekgül, Atakan
Uludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.
Ahmetoğlu, Muhitdin
Alper, Mürsel
Kucur, Banu
AAG-8795-2021
16021109400
7005719283
36903670200
Keywords: Materials science
Optics
Schottky diode
Ni thin films
Surfaces
Hf
Antimony compounds
Capacitance
Current voltage characteristics
Electrodeposition
Electrodes
Electrolytes
Gold compounds
Leakage currents
Nickel
Nickel compounds
Semiconductor diodes
Silicon
Silicon compounds
Thin films
Capacitance voltage measurements
Electrical characteristic
Electrical characterization
Electrodeposition technique
Metal semiconductor interface
Schottky diodes
Reverse bias leakage current
Schottky barrier diodes
Issue Date: 2012
Publisher: Natl Inst Optoelectronics
Citation: Ahmetoğlu, M. vd. (2012). "The electrical characterization of electrodeposited Ni thin film on silicon: Schottky barrier diodes". Optoelectronics and Advanced Materials-Rapid Communications, 6(1-2), 304-306.
Abstract: A Ni/n-Si Schottky barrier diode was produced by electrodeposition technique from the electrolyte containing nickel ions under galvanostatic control. The deposition was carried out in a three-electrode cell at room temperature. The electrical characteristics of the Schottky diodes have been investigated using current-voltage (l-V) and capacitance-voltage (C-V) measurements. Ni/n-Si/AuSb diode current-voltage characteristics display low reverse bias leakage currents. The barrier height and ideality factor (n) were obtained 0.60 eV and 3.28 respectively. The high ideality factor value was attributed to oxide layer at the metal semiconductor interface.
URI: http://hdl.handle.net/11452/26565
ISSN: 1842-6573
2065-3824
Appears in Collections:Scopus
Web of Science

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