Please use this identifier to cite or link to this item: http://hdl.handle.net/11452/34599
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dc.contributor.authorGürer, Umutcan-
dc.contributor.authorYılmaz, Ercan-
dc.date.accessioned2023-10-26T12:41:01Z-
dc.date.available2023-10-26T12:41:01Z-
dc.date.issued2020-12-
dc.identifier.citationKahraman, A. vd. (2020). "The effect and nature of the radiation induced oxide-interface traps on the performance of the Yb2O3 MOS device". Radiation Physics and Chemistry, 177.en_US
dc.identifier.issn0969-806X-
dc.identifier.urihttps://doi.org/10.1016/j.radphyschem.2020.109135-
dc.identifier.urihttp://hdl.handle.net/11452/34599-
dc.description.abstractModifications in the crystal properties, chemical compositions and bond contents as a result of irradiation of Yb2O3/Si structures annealed at different temperatures in the dose range of 1-50 kGy were investigated. Beside, comprehensive results on the effect of the structural changes on radiation response of the MOS capacitors produced with these structures was presented in this study. 122 nm-thick Yb2O3 films were grown on p-type Si by RF magnetron sputtering, and the Yb2O3/Si structures were annealed at 200 degrees C, 400 degrees C, 600 degrees C, 800 degrees C under nitrogen ambient. The radiation exposure disrupts the crystalline properties of the film. Yb 4 d and O 1s spectra were taken from different depths in the Yb2O3/Si structures with X-ray photoelectron spectroscopy. Reasons of the right-side shift in the capacitance voltage (C-V) curves of the as-deposited and 200 degrees C-Yb2O3 MOS capacitors with radiation exposure were determined as increasing 2+ oxidation state occurring with the trapping of the electrons in the Yb3+ defect centers, decreasing Si-Si bond contents causing the positive charge trapping at Yb2O3/Si interface, existence of the hydrogen defect precursors. Events causing the left-side shift of the C-V with radiation exposure may be the silicate layer developing at the interface, increase in the trapping of the positive charges in the Si-Si defect centers, and decreasing Yb-Yb and 2+ contents. The radiation responses of the 400 degrees C, 600 degrees C, 800 degrees C-Yb2O3 MOS capacitors could not be measured at the frequencies lower than 2 MHz due to high charge trapping, high binding energies of the Yb-O and Yb3+ peaks, increasing 2+ oxidation content. The C-V curve shifted to the left-side at the relatively lower dose of 1 kGy for only device composed of 200 degrees C-Yb2O3 film. The sensitivities of the 200 degrees C-Yb2O3 MOS capacitor were found to be 16.3 mV/Gy for 70 Gy.en_US
dc.description.sponsorshipTürkiye Cumhuriyeti Cumhurbaşkanlığı Strateji ve Bütçe Başkanlığı (2016K12-2834)tr_TR
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectChemistryen_US
dc.subjectNuclear science & technologyen_US
dc.subjectPhysicsen_US
dc.subjectYtterbium compoundsen_US
dc.subjectCapacitance voltageen_US
dc.subjectChemical compositionsen_US
dc.subjectCrystal propertiesen_US
dc.subjectCrystalline propertiesen_US
dc.subjectRadiation exposureen_US
dc.subjectRadiation responseen_US
dc.subjectRadiation-induceden_US
dc.subjectrf-Magnetron sputteringen_US
dc.subjectBinding energyen_US
dc.subjectCapacitanceen_US
dc.subjectCharge trappingen_US
dc.subjectChemical modificationen_US
dc.subjectDielectric devicesen_US
dc.subjectInterface statesen_US
dc.subjectMagnetron sputteringen_US
dc.subjectMOS capacitorsen_US
dc.subjectPhotoelectron spectroscopyen_US
dc.subjectRadiationen_US
dc.subjectSilicatesen_US
dc.subjectSiliconen_US
dc.subjectX ray photoelectron spectroscopyen_US
dc.subjectMOSen_US
dc.subjectXPSen_US
dc.subjectStructural modificationsen_US
dc.subjectSensoren_US
dc.subjectHigh-k dielectricsen_US
dc.subjectX Rayen_US
dc.subjectIrradiationen_US
dc.titleThe effect and nature of the radiation induced oxide-interface traps on the performance of the Yb2O3 MOS deviceen_US
dc.typeArticleen_US
dc.identifier.wos000588314100031tr_TR
dc.identifier.scopus2-s2.0-85092642168tr_TR
dc.relation.tubitak117R054tr_TR
dc.relation.tubitakARDEB1001tr_TR
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergitr_TR
dc.contributor.departmentBursa Uludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.tr_TR
dc.contributor.orcid0000-0002-1836-7033tr_TR
dc.identifier.volume177tr_TR
dc.relation.journalRadiation Physics and Chemistryen_US
dc.contributor.buuauthorKahraman, Ayşegül-
dc.contributor.researcheridAAH-6441-2021tr_TR
dc.subject.wosChemistry, physicalen_US
dc.subject.wosNuclear science & technologyen_US
dc.subject.wosPhysics, atomic, molecular & chemicalen_US
dc.indexed.wosSCIEen_US
dc.indexed.scopusScopusen_US
dc.wos.quartileQ3 (Chemistry, physical)en_US
dc.wos.quartileQ1 (Neurosciences)en_US
dc.wos.quartileQ2 (Physics, atomic, molecular & chemical)en_US
dc.contributor.scopusid47161190600tr_TR
dc.subject.scopusDosimeters; MOSFET; Radiationen_US
dc.subject.emtreeHydrogenen_US
dc.subject.emtreeMetal oxideen_US
dc.subject.emtreeNitrogenen_US
dc.subject.emtreeSiliconen_US
dc.subject.emtreeUnclassified drugen_US
dc.subject.emtreeYtterbium oxideen_US
dc.subject.emtreeYtterbiumen_US
dc.subject.emtreeArticleen_US
dc.subject.emtreeBinding energyen_US
dc.subject.emtreeCapacitance voltageen_US
dc.subject.emtreeChemical bindingen_US
dc.subject.emtreeChemical bonden_US
dc.subject.emtreeChemical compositionen_US
dc.subject.emtreeChemical parametersen_US
dc.subject.emtreeControlled studyen_US
dc.subject.emtreeCrystal structureen_US
dc.subject.emtreeElectric potentialen_US
dc.subject.emtreeElectronen_US
dc.subject.emtreeEnergyen_US
dc.subject.emtreeMos capacitoren_US
dc.subject.emtreeOxidationen_US
dc.subject.emtreeOxide interface trapen_US
dc.subject.emtreeRadiationen_US
dc.subject.emtreeRadiation doseen_US
dc.subject.emtreeRadiation exposureen_US
dc.subject.emtreeRadio frequency magnetron sputteringen_US
dc.subject.emtreeSurface propertyen_US
dc.subject.emtreeTemperatureen_US
dc.subject.emtreeThicknessen_US
dc.subject.emtreeX ray photoemission spectroscopyen_US
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